Moorestown, New Jersey, June XX, 2012 - Denton Vacuum LLC, a leading supplier of production scale thin film technology systems, today shipped a specially configured Integrity® system for wafer-level IR filter development to a world-renowned German R & D organization. IR filters are a key element of the camera sensor technology in smartphones, digital cameras, automotive back-up cameras and many other consumer and industrial products. Because the filters are so critical to today's electronics, multiple global companies and organizations are intensely engaged in enhancing IR filter functionality, reducing filter cost and integrating them into primary imaging sensors.
HAMPTON, VA. JULY 6, 2011 - Teledyne Hastings Instruments (THI) has recently introduced the THCD-100, a fully integrated 5-digit display and power supply for a wide choice of gas mass flow meters, gas mass flow controllers, and pressure transducers.
GF40 and GF80 thermal mass flow controllers (MFCs) provide outstanding performance, reliability and flexibility in many gas flow measurement and control applications.
HAMPTON, VA. JULY 6, 2011 - Teledyne Hastings Instruments (THI) has recently introduced the THCD-100, a fully integrated 5-digit display and power supply for a wide choice of gas mass flow meters, gas mass flow controllers, and pressure transducers. The THCD features...
NIAGARA, N.Y., U.S (March 1, 2012) - Edwards, a global leader of vacuum and abatement technology, will be giving a special preview of its new nXDS range of dry scroll vacuum pumps on Booth 2659 at Pittcon 2012, ahead of its official launch in April. Edwards will be performing a live demonstration of the new pump, which is expected to set new standards for dry pumping in laboratories.
Pfeiffer Vacuum, one of the world's leading producers of vacuum products and services, has introduced the Adixen ASI 30 fully integratable modular helium leak detector for industrial applications.
Kurt J. Lesker Company introduces Precursor Focusing Technology™ (PFT™)—an inactive gas and precursor dispersion apparatus for Atomic Layer Deposition (ALD) systems. This patent pending ALD precursor dispersion apparatus allows for focusing of precursor gas/vapor onto a substrate surface for improved process performance.