Osaka Vacuum was founded in 1950 in Naniwa, Osaka, by I. Kasaoka, an aircraft engineer, with the goal of perfecting the production of rotary vane mechanical pumps and vacuum coaters. By 1962, the Osaka and the Sakai facility of Osaka Vacuum were in full production of a wide variety of vacuum pumps, thin film deposition systems, and steam-jet ejectors. In 1970, in cooperation with the Physical & Chemical Institute of Japan, Osaka Vacuum successfully developed the first turbomolecular pump from Japan, which led to the opening of a new design and manufacturing facility in Hachioji. This design center was responsible for creation and introduction of the world's first compound turbomolecular pump in 1982 for wide range pumping; and the world's largest turbomolecular pump with 20,000 l/s pumping speed in 1990.

Today, Osaka Vacuum has three factories equipped with some of the most state-of-the-art machinery in Japan, covering more than 10,000 sq. meters in floor space. Osaka Vacuum now employs more than 300 people, mainly in R&D and manufacturing of vacuum equipment.

Sales and service worldwide are provided through a combination of Osaka Vacuum's direct divisions and independent representatives. The North America division, Osaka Vacuum U.S.A., Inc., located in Fremont CA, specializes in customizing applications specific to compound turbomolecular pump technology.

Product Lines

• Sputtering/evaporation systems
• Pumps - cryogenic
• Pumps - compound molecular/turbomolecular
• Crystal growth systems
• Pumps - diffusion
• Pumps - magnetic suspended/turbomolecular
• Water-jet ejectors
• Pumps - roots blowers
• Pumps - sputter ion
• Steam-jet ejectors
• Pumps - rotary vane
• Pumps - titanium sublimation

Products, Services, and Markets

Osaka Vacuum is a comprehensive and project-oriented vacuum equipment supplier. Through years of product development and manufacturing, Osaka Vacuum's products are used in a wide range of applications that can be generalized as follows:

1. Vacuum components, such as turbopumps and roots blowers, employed in microelectronic fabrication, energy research, scientific instrumentation, pharmaceutical, and other industrial processes where vacuum is essential.
2. Vacuum systems, such as sputtering and evaporation systems, used in the precise deposition of thin film for semiconductor, storage memory media, and flat panel display production.
3. Steam-jet/water-jet ejectors used in the chemical, food, and metallurgical industries.

Company Key Products

Osaka Vacuum is the global innovator of turbomolecular pump technology. For more than 30 years, we have led the way in research and manufacturing of turbopumps, categorized into the following:

1. Wide-range compound turbopumps:

• 50 l/s – 5,500 l/s nitrogen pumping speed; high throughput and cost effective

2. 5-axis active electromagnetic compound turbopumps (maintenance-free)

• Magnetically levitated: dry pumping and phenomenal mean-time-between-failure

• 340 l/s – 3,400 l/s nitrogen pumping speed: throughput and vibration free

3. Super wide-range drag/helical grooved pump:

• 10,000 SCCM throughput: ideal for transition flow and molecular flow pumping

4. Versatile TG-F series – new

• Affordable for every application
• Dry pumping and maintenance-free
• Robust: any mounting position
• 220 l/s, 350 l/s, 450 l/s, 800 l/s, 1,100 l/s, 2,400 l/s

5. XHV TMP

• Extreme high vacuum to 10^-12 torr based on Pneurop
• 260 l/s & 1,100 l/s

6. TG-ML series - new
TG-ML series, ultra-low vibration type, is the frequency weighted acceleration level for whole body vibration when suppressed to 1nm or less

• For electron micro scope
• For next generation semiconductor lithography “UV or EB Stepper”
• Micro and nano measurement equipment
• For next generation inspection equipment
• Analytical instruments – mass spectrometry; micro scope, and inspection of device

7. TG-MI series - new
Features our proprietary thermal insulating, auto-temperature rise mechanism (Patent No. 3098140)

• Controlling the temperature
• Minimizing reactive by-products
• Reducing condensation of suction gases